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A Study on Characteristics of Wet Oxide Gate and Nitride Oxide Gate for Fabrication of NMOSFET
Hwan Seog Kim , Cheon Hee Yi The KIPS Transactions:PartA,
Vol. 15, No. 4, pp. 211-216,
Aug.
2008
10.3745/KIPSTA.2008.15.4.211
10.3745/KIPSTA.2008.15.4.211
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All publications of KTCCS is indexed in DOI, EBSCO, Google Scholar, Crossref, and CrossCheck.
KTCCS is also selected as the Journal for Accreditation by NRF (National Research Foundation of Korea).
